Pierre-Yves Jouan
Pierre-Yves Jouan
Professeur Université de Nantes
Dirección de correo verificada de cnrs-imn.fr
TítuloCitado porAño
Characterisation of TiN coatings and of the TiN/Si interface by X-ray photoelectron spectroscopy and Auger electron spectroscopy
PY Jouan, MC Peignon, C Cardinaud, G Lempérière
Applied Surface Science 68 (4), 595-603, 1993
2131993
Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working …
KA Aissa, A Achour, J Camus, L Le Brizoual, PY Jouan, MA Djouadi
Thin Solid Films 550, 264-267, 2014
702014
Aluminium nitride films deposition by reactive triode sputtering for surface acoustic wave device applications
V Mortet, A Vasin, PY Jouan, O Elmazria, MA Djouadi
Surface and coatings technology 176 (1), 88-92, 2003
612003
Fretting wear properties of CrN and Cr2N coatings
A Tricoteaux, PY Jouan, JD Guerin, J Martinez, A Djouadi
Surface and Coatings Technology 174, 440-443, 2003
462003
Glow discharge mass spectrometry study of the deposition of thin films by direct current reactive magnetron sputtering of a Ti target
V Vancoppenolle, PY Jouan, M Wautelet, JP Dauchot, M Hecq
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17 (6 …, 1999
461999
Emission spectrometry diagnostic of sputtered titanium in magnetron amplified discharges
C Nouvellon, S Konstantinidis, JP Dauchot, M Wautelet, PY Jouan, ...
Journal of applied physics 92 (1), 32-36, 2002
372002
Deposition of nickel oxide by direct current reactive sputtering: Effect of oxygen partial pressure
A Karpinski, A Ferrec, M Richard-Plouet, L Cattin, MA Djouadi, L Brohan, ...
Thin Solid Films 520 (9), 3609-3613, 2012
352012
Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films
C Duquenne, PY Tessier, MP Besland, B Angleraud, PY Jouan, R Aubry, ...
Journal of Applied Physics 104 (6), 063301, 2008
352008
HiPIMS ion energy distribution measurements in reactive mode
PY Jouan, L Le Brizoual, M Ganciu, C Cardinaud, S Tricot, MA Djouadi
IEEE Transactions on Plasma Science 38 (11), 3089-3094, 2010
332010
Dc magnetron sputtering deposition of TiO2 films in argon–oxygen gas mixtures: theory and experiments
V Vancoppenolle, PY Jouan, M Wautelet, JP Dauchot, M Hecq
Surface and Coatings Technology 116, 933-937, 1999
331999
Optical characterization of transparent nickel oxide films deposited by DC current reactive sputtering
A Karpinski, N Ouldhamadouche, A Ferrec, L Cattin, M Richard-Plouet, ...
Thin Solid Films 519 (17), 5767-5770, 2011
302011
Thickness and substrate effects on AlN thin film growth at room temperature
B Abdallah, C Duquenne, MP Besland, E Gautron, PY Jouan, PY Tessier, ...
The European Physical Journal-Applied Physics 43 (3), 309-313, 2008
302008
Deposition of AlN films by reactive sputtering: Effect of radiofrequency substrate bias
B Abdallah, A Chala, PY Jouan, MP Besland, MA Djouadi
Thin Solid Films 515 (18), 7105-7108, 2007
282007
Epitaxial growth of aluminum nitride on AlGaN by reactive sputtering at low temperature
C Duquenne, MA Djouadi, PY Tessier, PY Jouan, MP Besland, C Brylinski, ...
Applied Physics Letters 93 (5), 052905, 2008
252008
Nitrogen doping on NiO by reactive magnetron sputtering: a new pathway to dynamically tune the optical and electrical properties
J Keraudy, A Ferrec, M Richard-Plouet, J Hamon, A Goullet, PY Jouan
Applied Surface Science 409, 77-84, 2017
232017
XPS study of the band alignment at ITO/oxide (n‐type MoO3 or p‐type NiO) interface
JC Bernède, S Houari, D Nguyen, PY Jouan, A Khelil, A Mokrani, L Cattin, ...
physica status solidi (a) 209 (7), 1291-1297, 2012
232012
On the use of response surface methodology to predict and interpret the preferred c-axis orientation of sputtered AlN thin films
J Adamczyk, N Horny, A Tricoteaux, PY Jouan, M Zadam
Applied Surface Science 254 (6), 1744-1750, 2008
232008
Oxygen active species in an Ar–O2 magnetron discharge for titanium oxide deposition
V Vancoppenolle, PY Jouan, A Ricard, M Wautelet, JP Dauchot, M Hecq
Applied Surface Science 205 (1-4), 249-255, 2003
222003
Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering
J Keraudy, JG Molleja, A Ferrec, B Corraze, M Richard-Plouet, A Goullet, ...
Applied Surface Science 357, 838-844, 2015
212015
AlN thin films deposited by DC reactive magnetron sputtering: effect of oxygen on film growth
JG Molleja, BJ Gómez, J Ferrón, E Gautron, J Bürgi, B Abdallah, ...
The European Physical Journal-Applied Physics 64 (2), 2013
202013
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