Characterisation of TiN coatings and of the TiN/Si interface by X-ray photoelectron spectroscopy and Auger electron spectroscopy PY Jouan, MC Peignon, C Cardinaud, G Lempérière
Applied Surface Science 68 (4), 595-603, 1993
213 1993 Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working … KA Aissa, A Achour, J Camus, L Le Brizoual, PY Jouan, MA Djouadi
Thin Solid Films 550, 264-267, 2014
70 2014 Aluminium nitride films deposition by reactive triode sputtering for surface acoustic wave device applications V Mortet, A Vasin, PY Jouan, O Elmazria, MA Djouadi
Surface and coatings technology 176 (1), 88-92, 2003
61 2003 Fretting wear properties of CrN and Cr2N coatings A Tricoteaux, PY Jouan, JD Guerin, J Martinez, A Djouadi
Surface and Coatings Technology 174, 440-443, 2003
46 2003 Glow discharge mass spectrometry study of the deposition of thin films by direct current reactive magnetron sputtering of a Ti target V Vancoppenolle, PY Jouan, M Wautelet, JP Dauchot, M Hecq
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17 (6 …, 1999
46 1999 Emission spectrometry diagnostic of sputtered titanium in magnetron amplified discharges C Nouvellon, S Konstantinidis, JP Dauchot, M Wautelet, PY Jouan, ...
Journal of applied physics 92 (1), 32-36, 2002
37 2002 Deposition of nickel oxide by direct current reactive sputtering: Effect of oxygen partial pressure A Karpinski, A Ferrec, M Richard-Plouet, L Cattin, MA Djouadi, L Brohan, ...
Thin Solid Films 520 (9), 3609-3613, 2012
35 2012 Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films C Duquenne, PY Tessier, MP Besland, B Angleraud, PY Jouan, R Aubry, ...
Journal of Applied Physics 104 (6), 063301, 2008
35 2008 HiPIMS ion energy distribution measurements in reactive mode PY Jouan, L Le Brizoual, M Ganciu, C Cardinaud, S Tricot, MA Djouadi
IEEE Transactions on Plasma Science 38 (11), 3089-3094, 2010
33 2010 Dc magnetron sputtering deposition of TiO2 films in argon–oxygen gas mixtures: theory and experiments V Vancoppenolle, PY Jouan, M Wautelet, JP Dauchot, M Hecq
Surface and Coatings Technology 116, 933-937, 1999
33 1999 Optical characterization of transparent nickel oxide films deposited by DC current reactive sputtering A Karpinski, N Ouldhamadouche, A Ferrec, L Cattin, M Richard-Plouet, ...
Thin Solid Films 519 (17), 5767-5770, 2011
30 2011 Thickness and substrate effects on AlN thin film growth at room temperature B Abdallah, C Duquenne, MP Besland, E Gautron, PY Jouan, PY Tessier, ...
The European Physical Journal-Applied Physics 43 (3), 309-313, 2008
30 2008 Deposition of AlN films by reactive sputtering: Effect of radiofrequency substrate bias B Abdallah, A Chala, PY Jouan, MP Besland, MA Djouadi
Thin Solid Films 515 (18), 7105-7108, 2007
28 2007 Epitaxial growth of aluminum nitride on AlGaN by reactive sputtering at low temperature C Duquenne, MA Djouadi, PY Tessier, PY Jouan, MP Besland, C Brylinski, ...
Applied Physics Letters 93 (5), 052905, 2008
25 2008 Nitrogen doping on NiO by reactive magnetron sputtering: a new pathway to dynamically tune the optical and electrical properties J Keraudy, A Ferrec, M Richard-Plouet, J Hamon, A Goullet, PY Jouan
Applied Surface Science 409, 77-84, 2017
23 2017 XPS study of the band alignment at ITO/oxide (n‐type MoO3 or p‐type NiO) interface JC Bernède, S Houari, D Nguyen, PY Jouan, A Khelil, A Mokrani, L Cattin, ...
physica status solidi (a) 209 (7), 1291-1297, 2012
23 2012 On the use of response surface methodology to predict and interpret the preferred c-axis orientation of sputtered AlN thin films J Adamczyk, N Horny, A Tricoteaux, PY Jouan, M Zadam
Applied Surface Science 254 (6), 1744-1750, 2008
23 2008 Oxygen active species in an Ar–O2 magnetron discharge for titanium oxide deposition V Vancoppenolle, PY Jouan, A Ricard, M Wautelet, JP Dauchot, M Hecq
Applied Surface Science 205 (1-4), 249-255, 2003
22 2003 Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering J Keraudy, JG Molleja, A Ferrec, B Corraze, M Richard-Plouet, A Goullet, ...
Applied Surface Science 357, 838-844, 2015
21 2015 AlN thin films deposited by DC reactive magnetron sputtering: effect of oxygen on film growth JG Molleja, BJ Gómez, J Ferrón, E Gautron, J Bürgi, B Abdallah, ...
The European Physical Journal-Applied Physics 64 (2), 2013
20 2013