| Step and flash imprint lithography: a new approach to high-resolution patterning M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ... Emerging Lithographic Technologies III 3676, 379-389, 1999 | 927 | 1999 |
| Step and flash imprint lithography: Template surface treatment and defect analysis T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 487 | 2000 |
| Step and repeat imprint lithography processes SV Sreenivasan, BJ Choi, NE Schumaker, RD Voisin, MPC Watts, ... US Patent 7,077,992, 2006 | 410 | 2006 |
| Template for room temperature, low pressure micro-and nano-imprint lithography T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt US Patent 6,696,220, 2004 | 402 | 2004 |
| Formation of discontinuous films during an imprint lithography process BJ Choi, MJ Meissl, SV Sreenivasan, MPC Watts US Patent 6,932,934, 2005 | 349 | 2005 |
| Step and repeat imprint lithography systems SV Sreenivasan, MPC Watts, BJ Choi, MJ Meissl, NE Schumaker, ... US Patent 6,900,881, 2005 | 280 | 2005 |
| Formation of discontinuous films during an imprint lithography process BJ Choi, MJ Meissl, SV Sreenivasan, MPC Watts US Patent 6,932,934, 2005 | 270 | 2005 |
| Method for imprint lithography using an electric field SV Sreenivasan, RT Bonnecaze, CG Willson US Patent 6,908,861, 2005 | 248 | 2005 |
| Mammalian cells preferentially internalize hydrogel nanodiscs over nanorods and use shape-specific uptake mechanisms R Agarwal, V Singh, P Jurney, L Shi, SV Sreenivasan, K Roy Proceedings of the National Academy of Sciences 110 (43), 17247-17252, 2013 | 238 | 2013 |
| Alignment systems for imprint lithography SV Sreenivasan, MPC Watts, BJ Choi, RD Voisin, NE Schumaker US Patent 7,070,405, 2006 | 236 | 2006 |
| Alignment methods for imprint lithography SV Sreenivasan, MPC Watts, BJ Choi, RD Voisin US Patent 6,916,584, 2005 | 236 | 2005 |
| Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography P Ruchhoeft, M Colburn, B Choi, H Nounu, S Johnson, T Bailey, S Damle, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 197 | 1999 |
| High precision orientation alignment and gap control stages for imprint lithography processes BJ Choi, SV Sreenivasan, SC Johnson US Patent 6,873,087, 2005 | 170 | 2005 |
| Design of orientation stages for step and flash imprint lithography BJ Choi, SV Sreenivasan, S Johnson, M Colburn, CG Wilson Precision Engineering 25 (3), 192-199, 2001 | 168 | 2001 |
| Step & flash imprint lithography DJ Resnick, SV Sreenivasan, CG Willson Materials today 8 (2), 34-42, 2005 | 163 | 2005 |
| In vivo ruminant health sensor D Kuhn, D Kohn US Patent App. 10/336,062, 2004 | 159 | 2004 |
| High-resolution overlay alignment methods for imprint lithography SV Sreenivasan, BJ Choi, M Colburn, T Bailey US Patent 6,921,615, 2005 | 158 | 2005 |
| Step and flash imprint lithography for sub-100-nm patterning M Colburn, A Grot, MN Amistoso, BJ Choi, TC Bailey, JG Ekerdt, ... Emerging Lithographic Technologies IV 3997, 453-457, 2000 | 156 | 2000 |
| Imprint lithography for integrated circuit fabrication DJ Resnick, WJ Dauksher, D Mancini, KJ Nordquist, TC Bailey, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 155 | 2003 |
| Method to arrange features on a substrate to replicate features having minimal dimensional variability SV Sreenivasan, MPC Watts US Patent 8,349,241, 2013 | 147 | 2013 |
Carl HaasProfessor of Engineering, University of WaterlooDirección de correo verificada de uwaterloo.ca
